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Wafer scale reactive sputtering of highly oriented and ferroelectric Al$_{0.6}$Sc$_{0.4}$N from 300 mm AlSc Targets

Fuente: arXiv

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Bibliographic Details
Main Authors:	Kreutzer, Tom-Niklas, Ghori, Muhammad Zubair, Islam, Md Redwanul, Lofink, Fabian, Stoppel, Fabian, Müller-Groeling, Axel, Fichtner, Simon
Format:	Preprint
Published:	2025
Subjects:	Materials Science Applied Physics
Online Access:	Acceder al recurso
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