Ferroelectric Al$_{1-x}$B$_x$N sputtered thin films on n-type Si bottom electrodes
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arXiv
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| Format: | Preprint |
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2025
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| author | Mercer, Ian Skidmore, Chloe Calderon, Sebastian Dickey, Elizabeth Maria, Jon-Paul |
| author_facet | Mercer, Ian Skidmore, Chloe Calderon, Sebastian Dickey, Elizabeth Maria, Jon-Paul |
| contents | Ferroelectric Al$_{1-x}$B$_x$N thin films are grown on highly doped and plasma treated (100) n-type Si. We demonstrate ferroelectricity for x = <0.01, 0.02, 0.06, 0.08, 0.13, and 0.17 where the n-type Si is both the substrate and bottom electrode. Polarization hysteresis reveals remanent polarization values between 130-140 $μ$C/cm$^2$ and coercive field values as low as 4 MV/cm at 1 Hz with low leakage. The highest re-sistivity and most saturating hysteresis occurs with B contents between x = 0.06 and 0.13. We also demonstrate the impact of substrate plasma treatment time on Al$_{1-x}$B$_x$N crystallinity and switching. Cross-sectional transmission electron microscopy and electron energy loss spectra reveal an amorphous 3.5 nm SiNx layer at the Al$_{1-x}$B$_x$N interface post-plasma treatment and deposition. The first $\sim 5$ nm of Al$_{1-x}$B$_x$N is crystallographically defective. Using the n-type Si substrate we demonstrate Al$_{1-x}$B$_x$N thick-ness scaling to 25 nm via low frequency hysteresis and CV. Serving as the bottom electrode and sub-strate, the n-type Si enables a streamlined growth process for Al$_{1-x}$B$_x$N for a wide range of Al$_{1-x}$B$_x$N compositions and layer thicknesses. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2504_04344 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Ferroelectric Al$_{1-x}$B$_x$N sputtered thin films on n-type Si bottom electrodes Mercer, Ian Skidmore, Chloe Calderon, Sebastian Dickey, Elizabeth Maria, Jon-Paul Materials Science Applied Physics Ferroelectric Al$_{1-x}$B$_x$N thin films are grown on highly doped and plasma treated (100) n-type Si. We demonstrate ferroelectricity for x = <0.01, 0.02, 0.06, 0.08, 0.13, and 0.17 where the n-type Si is both the substrate and bottom electrode. Polarization hysteresis reveals remanent polarization values between 130-140 $μ$C/cm$^2$ and coercive field values as low as 4 MV/cm at 1 Hz with low leakage. The highest re-sistivity and most saturating hysteresis occurs with B contents between x = 0.06 and 0.13. We also demonstrate the impact of substrate plasma treatment time on Al$_{1-x}$B$_x$N crystallinity and switching. Cross-sectional transmission electron microscopy and electron energy loss spectra reveal an amorphous 3.5 nm SiNx layer at the Al$_{1-x}$B$_x$N interface post-plasma treatment and deposition. The first $\sim 5$ nm of Al$_{1-x}$B$_x$N is crystallographically defective. Using the n-type Si substrate we demonstrate Al$_{1-x}$B$_x$N thick-ness scaling to 25 nm via low frequency hysteresis and CV. Serving as the bottom electrode and sub-strate, the n-type Si enables a streamlined growth process for Al$_{1-x}$B$_x$N for a wide range of Al$_{1-x}$B$_x$N compositions and layer thicknesses. |
| title | Ferroelectric Al$_{1-x}$B$_x$N sputtered thin films on n-type Si bottom electrodes |
| topic | Materials Science Applied Physics |
| url | https://arxiv.org/abs/2504.04344 |