Transient population dynamics of nanoparticles during pulsed EUV exposures
Fuente:
arXiv
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| Autores principales: | , , , , , |
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| Formato: | Preprint |
| Publicado: |
2025
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| Acceso en línea: | |
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| _version_ | 1866916679070515200 |
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| author | Chaudhuri, M. Heijmans, L. C. J. Yakunin, A. M. Krainov, P. Astakhov, D. van de Kerkhof, M. |
| author_facet | Chaudhuri, M. Heijmans, L. C. J. Yakunin, A. M. Krainov, P. Astakhov, D. van de Kerkhof, M. |
| contents | The transient population dynamics of charged (postive or negative) and neutral nanoparticles have been investigated in a pulsed Extreme Ultra-Violet (EUV) exposure environment with 3DPIC simulations. At the initial stage of the simulation, all the particles are kept neutral. As the number of EUV pulses increases over time, the population of neutral particle decreases faster at the expense of negatively charged particle generation outside the beam location. However, a small population (< 1%) of neutral particles become positively charged due to EUV photon interaction within the beam area and remains in steady state over time. The critical pulse numbers have been estimated for different nanometer size particles above which most of the particles outside the beam locations become negatively charged: smaller is the particle size, larger is the critical pulse number. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2504_05971 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Transient population dynamics of nanoparticles during pulsed EUV exposures Chaudhuri, M. Heijmans, L. C. J. Yakunin, A. M. Krainov, P. Astakhov, D. van de Kerkhof, M. Plasma Physics The transient population dynamics of charged (postive or negative) and neutral nanoparticles have been investigated in a pulsed Extreme Ultra-Violet (EUV) exposure environment with 3DPIC simulations. At the initial stage of the simulation, all the particles are kept neutral. As the number of EUV pulses increases over time, the population of neutral particle decreases faster at the expense of negatively charged particle generation outside the beam location. However, a small population (< 1%) of neutral particles become positively charged due to EUV photon interaction within the beam area and remains in steady state over time. The critical pulse numbers have been estimated for different nanometer size particles above which most of the particles outside the beam locations become negatively charged: smaller is the particle size, larger is the critical pulse number. |
| title | Transient population dynamics of nanoparticles during pulsed EUV exposures |
| topic | Plasma Physics |
| url | https://arxiv.org/abs/2504.05971 |