XY-Cut++: Advanced Layout Ordering via Hierarchical Mask Mechanism on a Novel Benchmark

Fuente: arXiv

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Bibliographic Details
Main Authors:	Liu, Shuai, Li, Youmeng, Wei, Jizeng
Format:	Preprint
Published:	2025
Subjects:	Computer Vision and Pattern Recognition Multimedia
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2504.10258