Yi, X., & Chen, J. (2025). Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation.
Chicago Style (17th ed.) CitationYi, Xiaoru, and Junqing Chen. Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation. 2025.
MLA (9th ed.) CitationYi, Xiaoru, and Junqing Chen. Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation. 2025.
Warning: These citations may not always be 100% accurate.