Yi, X., & Chen, J. (2025). Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation.
Citazione stile Chigago Style (17a edizione)Yi, Xiaoru, e Junqing Chen. Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation. 2025.
Citatione MLA (9a ed.)Yi, Xiaoru, e Junqing Chen. Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation. 2025.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.