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| Main Authors: | , , |
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| Format: | Preprint |
| Published: |
2025
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2504.20439 |
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| _version_ | 1866915265687584768 |
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| author | Jia, Xuanyu Liao, Hongxu Li, Ming |
| author_facet | Jia, Xuanyu Liao, Hongxu Li, Ming |
| contents | In this article, we present a contact resistivity extraction method calibrated using a de-embedding structure, called High-Resolution Transmission Line Model (HR-TLM). HR-TLM has the similar infrastructure with Refined TLM (RTLM) or Refined-Ladder TLM(R-LTLM), but is optimized for calibration methods. Its advantage lies in maintaining low \r{ho}_c extraction accuracy while significantly reducing the impact of structural process errors. According to the error analysis model, we verify that the extraction accuracy of HR-TLM based on R-LTLM can reach 10-9 Ωcm2 at micron scale lithography precision. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2504_20439 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | A High-Resolution Transmission Line Model with De-embedding Structure for Ultralow Contact Resistivity Extraction Jia, Xuanyu Liao, Hongxu Li, Ming Signal Processing In this article, we present a contact resistivity extraction method calibrated using a de-embedding structure, called High-Resolution Transmission Line Model (HR-TLM). HR-TLM has the similar infrastructure with Refined TLM (RTLM) or Refined-Ladder TLM(R-LTLM), but is optimized for calibration methods. Its advantage lies in maintaining low \r{ho}_c extraction accuracy while significantly reducing the impact of structural process errors. According to the error analysis model, we verify that the extraction accuracy of HR-TLM based on R-LTLM can reach 10-9 Ωcm2 at micron scale lithography precision. |
| title | A High-Resolution Transmission Line Model with De-embedding Structure for Ultralow Contact Resistivity Extraction |
| topic | Signal Processing |
| url | https://arxiv.org/abs/2504.20439 |