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Main Authors: Jia, Xuanyu, Liao, Hongxu, Li, Ming
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2504.20439
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_version_ 1866915265687584768
author Jia, Xuanyu
Liao, Hongxu
Li, Ming
author_facet Jia, Xuanyu
Liao, Hongxu
Li, Ming
contents In this article, we present a contact resistivity extraction method calibrated using a de-embedding structure, called High-Resolution Transmission Line Model (HR-TLM). HR-TLM has the similar infrastructure with Refined TLM (RTLM) or Refined-Ladder TLM(R-LTLM), but is optimized for calibration methods. Its advantage lies in maintaining low \r{ho}_c extraction accuracy while significantly reducing the impact of structural process errors. According to the error analysis model, we verify that the extraction accuracy of HR-TLM based on R-LTLM can reach 10-9 Ωcm2 at micron scale lithography precision.
format Preprint
id arxiv_https___arxiv_org_abs_2504_20439
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle A High-Resolution Transmission Line Model with De-embedding Structure for Ultralow Contact Resistivity Extraction
Jia, Xuanyu
Liao, Hongxu
Li, Ming
Signal Processing
In this article, we present a contact resistivity extraction method calibrated using a de-embedding structure, called High-Resolution Transmission Line Model (HR-TLM). HR-TLM has the similar infrastructure with Refined TLM (RTLM) or Refined-Ladder TLM(R-LTLM), but is optimized for calibration methods. Its advantage lies in maintaining low \r{ho}_c extraction accuracy while significantly reducing the impact of structural process errors. According to the error analysis model, we verify that the extraction accuracy of HR-TLM based on R-LTLM can reach 10-9 Ωcm2 at micron scale lithography precision.
title A High-Resolution Transmission Line Model with De-embedding Structure for Ultralow Contact Resistivity Extraction
topic Signal Processing
url https://arxiv.org/abs/2504.20439