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Main Authors: Chan-Lock, Antoine, Otaduy, Miguel
Format: Preprint
Published: 2025
Subjects:
Online Access:https://arxiv.org/abs/2505.01779
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_version_ 1866908349262462976
author Chan-Lock, Antoine
Otaduy, Miguel
author_facet Chan-Lock, Antoine
Otaduy, Miguel
contents This paper introduces a new formulation for material homogenization of thin-shell microstructures. It addresses important challenges that limit the quality of previous approaches: methods that fit the energy response neglect visual impact, methods that fit the stress response are not conservative, and all of them are limited to a low-dimensional interplay between deformation modes. The new formulation is rooted on the following design principles: the material energy functions are conservative by definition, they are formulated on the high-dimensional membrane and bending domain to capture the complex interplay of the different deformation modes, the material function domain is maximally aligned with the training data, and the material parameters and the optimization are formulated on stress instead of energy for better correlation with visual impact. The key novelty of our formulation is a new type of high-order RBF interpolant for polar coordinates, which allows us to fulfill all the design principles. We design a material function using this novel interpolant, as well as an overall homogenization workflow. Our results demonstrate very accurate fitting of diverse microstructure behaviors, both quantitatively and qualitatively superior to previous work.
format Preprint
id arxiv_https___arxiv_org_abs_2505_01779
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Polar Interpolants for Thin-Shell Microstructure Homogenization
Chan-Lock, Antoine
Otaduy, Miguel
Computational Physics
Graphics
This paper introduces a new formulation for material homogenization of thin-shell microstructures. It addresses important challenges that limit the quality of previous approaches: methods that fit the energy response neglect visual impact, methods that fit the stress response are not conservative, and all of them are limited to a low-dimensional interplay between deformation modes. The new formulation is rooted on the following design principles: the material energy functions are conservative by definition, they are formulated on the high-dimensional membrane and bending domain to capture the complex interplay of the different deformation modes, the material function domain is maximally aligned with the training data, and the material parameters and the optimization are formulated on stress instead of energy for better correlation with visual impact. The key novelty of our formulation is a new type of high-order RBF interpolant for polar coordinates, which allows us to fulfill all the design principles. We design a material function using this novel interpolant, as well as an overall homogenization workflow. Our results demonstrate very accurate fitting of diverse microstructure behaviors, both quantitatively and qualitatively superior to previous work.
title Polar Interpolants for Thin-Shell Microstructure Homogenization
topic Computational Physics
Graphics
url https://arxiv.org/abs/2505.01779