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Accelerating the development of oxynitride thin films: A combinatorial investigation of the Al-Si-O-N system

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Frick, Stefanie, Pshyk, Oleksandr, Müller, Arnold, Wieczorek, Alexander, Thorwarth, Kerstin, Siol, Sebastian
Format:	Preprint
Publié:	2025
Sujets:	Materials Science
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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