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In-situ and Non-contact Etch Depth Prediction in Plasma Etching via Machine Learning (ANN & BNN) and Digital Image Colorimetry

Fuente: arXiv
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Bibliographic Details
Main Authors: Kang, Minji, Kim, Seongho, Go, Eunseo, Paek, Donghyeon, Lim, Geon, Kim, Muyoung, Kim, Soyeun, Jang, Sung Kyu, Choi, Min Sup, Kang, Woo Seok, Kim, Jaehyun, Kim, Jaekwang, Kim, Hyeong-U
Format: Preprint
Published: 2025
Subjects:
Computer Vision and Pattern Recognition
Artificial Intelligence
Online Access:
Acceder al recurso
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