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Main Authors: Abraham, David E., Cui, Daniel, Liang, Baolai, Hwang, Jae S., Santhanam, Parthiban, Kim, Linus, Lin, Rayen, Raman, Aaswath P.
Format: Preprint
Published: 2025
Subjects:
Online Access:https://arxiv.org/abs/2505.03905
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author Abraham, David E.
Cui, Daniel
Liang, Baolai
Hwang, Jae S.
Santhanam, Parthiban
Kim, Linus
Lin, Rayen
Raman, Aaswath P.
author_facet Abraham, David E.
Cui, Daniel
Liang, Baolai
Hwang, Jae S.
Santhanam, Parthiban
Kim, Linus
Lin, Rayen
Raman, Aaswath P.
contents Directional and spectral control of thermal emission is essential for applications in energy conversion, imaging, and sensing. Existing planar, lithography-free epsilon-near-zero (ENZ) films only support transverse-magnetic (TM) control of thermal emission via the Berreman mode and cannot address transverse-electric (TE) waves due to the absence of natural optical magnetism over optical and infrared wavelengths Here, we introduce a hyperbolic metamaterial comprising alternating layers of degenerately-doped and intrinsic InAs that exhibits an epsilon-and-mu-near-zero (EMNZ) response, enabling dual-polarized, directionally and spectrally selective thermal emission. We first theoretically demonstrate that a mu-near-zero (MNZ) film on a perfect magnetic conductor supports a magnetic Berreman mode, absorbing TE-polarized radiation in analogy to the conventional Berreman mode supported in TM polarization. Using genetic and gradient-descent optimization, we design a dual-polarized emitter with independently tunable spectral peaks and emission angles. Parameter retrieval via homogenization confirms simultaneous EMNZ points at the target wavelengths and angles. Finally, experimental measurement of a sample fabricated via molecular beam epitaxy exhibits high absorptivity peaks for both polarizations in close agreement with simulations. This work realizes lithography-free, dual-polarized, spectrally and directionally selective emitters, offering a versatile platform for advanced infrared thermal management and device integration.
format Preprint
id arxiv_https___arxiv_org_abs_2505_03905
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Directional Thermal Emission Across Both Polarizations in Planar Photonic Architectures
Abraham, David E.
Cui, Daniel
Liang, Baolai
Hwang, Jae S.
Santhanam, Parthiban
Kim, Linus
Lin, Rayen
Raman, Aaswath P.
Materials Science
Applied Physics
Directional and spectral control of thermal emission is essential for applications in energy conversion, imaging, and sensing. Existing planar, lithography-free epsilon-near-zero (ENZ) films only support transverse-magnetic (TM) control of thermal emission via the Berreman mode and cannot address transverse-electric (TE) waves due to the absence of natural optical magnetism over optical and infrared wavelengths Here, we introduce a hyperbolic metamaterial comprising alternating layers of degenerately-doped and intrinsic InAs that exhibits an epsilon-and-mu-near-zero (EMNZ) response, enabling dual-polarized, directionally and spectrally selective thermal emission. We first theoretically demonstrate that a mu-near-zero (MNZ) film on a perfect magnetic conductor supports a magnetic Berreman mode, absorbing TE-polarized radiation in analogy to the conventional Berreman mode supported in TM polarization. Using genetic and gradient-descent optimization, we design a dual-polarized emitter with independently tunable spectral peaks and emission angles. Parameter retrieval via homogenization confirms simultaneous EMNZ points at the target wavelengths and angles. Finally, experimental measurement of a sample fabricated via molecular beam epitaxy exhibits high absorptivity peaks for both polarizations in close agreement with simulations. This work realizes lithography-free, dual-polarized, spectrally and directionally selective emitters, offering a versatile platform for advanced infrared thermal management and device integration.
title Directional Thermal Emission Across Both Polarizations in Planar Photonic Architectures
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2505.03905