Topological surface states induced by the magnetic proximity effect

Fuente: arXiv
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Main Authors: Fukuoka, Soichiro, Anh, Le Duc, Ishida, Masayuki, Hotta, Tomoki, Chiba, Takahiro, Kota, Yohei, Tanaka, Masaaki
Format: Preprint
Published: 2025
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_version_ 1866909683725369344
author Fukuoka, Soichiro
Anh, Le Duc
Ishida, Masayuki
Hotta, Tomoki
Chiba, Takahiro
Kota, Yohei
Tanaka, Masaaki
author_facet Fukuoka, Soichiro
Anh, Le Duc
Ishida, Masayuki
Hotta, Tomoki
Chiba, Takahiro
Kota, Yohei
Tanaka, Masaaki
contents The combination of magnetism and topological properties in one material platform is attracting significant attention due to the potential of realizing low power consumption and error-robust electronic devices. Common practice is to start from a topological material with band inversion and incorporates ferromagnetism via chemical doping or magnetic proximity effect (MPE). In this work, we show that a topological material is not necessary and that both ferromagnetism and band inversion can be established simultaneously in a trivial insulating material by MPE from a neighbouring ferromagnetic layer. This novel route is demonstrated using quantum transport measurements and first principles calculations in a heterostructure consisting of 5 nm thick FeOx/1 monolayer of FeAs/ 3 nm thick alpha Sn. The Shubnikov de Haas oscillations show that there is linear band dispersion with high mobility in the heterostructure even though a 3 nm thick alpha Sn single layer is a trivial semiconductor. Furthermore, first principles calculations reveal that band inversion indeed occurs in this heterostructure, suggesting that the observed linear band is a topological surface state within this inverted gap. This work significantly expands the foundation for realizing magnetic topological materials in a myriad of trivial narrow gap semiconductors.
format Preprint
id arxiv_https___arxiv_org_abs_2505_07250
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Topological surface states induced by the magnetic proximity effect
Fukuoka, Soichiro
Anh, Le Duc
Ishida, Masayuki
Hotta, Tomoki
Chiba, Takahiro
Kota, Yohei
Tanaka, Masaaki
Materials Science
The combination of magnetism and topological properties in one material platform is attracting significant attention due to the potential of realizing low power consumption and error-robust electronic devices. Common practice is to start from a topological material with band inversion and incorporates ferromagnetism via chemical doping or magnetic proximity effect (MPE). In this work, we show that a topological material is not necessary and that both ferromagnetism and band inversion can be established simultaneously in a trivial insulating material by MPE from a neighbouring ferromagnetic layer. This novel route is demonstrated using quantum transport measurements and first principles calculations in a heterostructure consisting of 5 nm thick FeOx/1 monolayer of FeAs/ 3 nm thick alpha Sn. The Shubnikov de Haas oscillations show that there is linear band dispersion with high mobility in the heterostructure even though a 3 nm thick alpha Sn single layer is a trivial semiconductor. Furthermore, first principles calculations reveal that band inversion indeed occurs in this heterostructure, suggesting that the observed linear band is a topological surface state within this inverted gap. This work significantly expands the foundation for realizing magnetic topological materials in a myriad of trivial narrow gap semiconductors.
title Topological surface states induced by the magnetic proximity effect
topic Materials Science
url https://arxiv.org/abs/2505.07250