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Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined Theoretical and Experimental Approach

Fuente: arXiv

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Bibliographic Details
Main Authors:	Galleni, Laura, Singh, Dhirendra P., Conard, Thierry, Pourtois, Geoffrey, van der Heide, Paul, Petersen, John, Dorney, Kevin M., van Setten, Michiel J.
Format:	Preprint
Published:	2025
Subjects:	Materials Science
Online Access:	Acceder al recurso
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