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Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists

Fuente: arXiv

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Bibliographic Details
Main Authors:	Dorney, Kevin M., Pollentier, Ivan, Holzmeier, Fabian, Fallica, Roberto, Chen, Ying-Lin, Piatti, Lorenzo, Singh, Dhirendra, Galleni, Laura, van Setten, Michiel J., Suh, Hyo Seon, De Simone, Danilo, Pourtois, Geoffrey, van der Heide, Paul, Petersen, John
Format:	Preprint
Published:	2025
Subjects:	Materials Science
Online Access:	Acceder al recurso
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