Improving the low-dose performance of aberration correction in single sideband ptychography

Fuente: arXiv
Saved in:
Bibliographic Details
Main Authors: Li, Songge, Gauquelin, Nicolas, Robert, Hoelen L. Lalandec, Annys, Arno, Gao, Chuang, Hofer, Christoph, Pennycook, Timothy J., Verbeeck, Jo
Format: Preprint
Published: 2025
Subjects:
Online Access:
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866908913031446528
author Li, Songge
Gauquelin, Nicolas
Robert, Hoelen L. Lalandec
Annys, Arno
Gao, Chuang
Hofer, Christoph
Pennycook, Timothy J.
Verbeeck, Jo
author_facet Li, Songge
Gauquelin, Nicolas
Robert, Hoelen L. Lalandec
Annys, Arno
Gao, Chuang
Hofer, Christoph
Pennycook, Timothy J.
Verbeeck, Jo
contents The single sideband (SSB) framework of analytical electron ptychography can account for the presence of residual geometrical aberrations induced by the probe-forming lens. However, the accuracy of this aberration correction method is highly sensitive to noise, in part due to the necessity of phase unwrapping. In this work, we thus propose two strategies to improve aberration correction performance in low-dose conditions: confining phase unwrapping within the sidebands and selecting only well-unwrapped sidebands for calculating aberration coefficients. These strategies are validated through SSB reconstructions of both simulated and experimental 4D-STEM datasets of monolayer tungsten diselenide (WSe2). A comparison of results demonstrates significant improvements in Poisson noise tolerance, making aberration correction more robust and reliable for low-dose imaging.
format Preprint
id arxiv_https___arxiv_org_abs_2505_09555
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Improving the low-dose performance of aberration correction in single sideband ptychography
Li, Songge
Gauquelin, Nicolas
Robert, Hoelen L. Lalandec
Annys, Arno
Gao, Chuang
Hofer, Christoph
Pennycook, Timothy J.
Verbeeck, Jo
Applied Physics
The single sideband (SSB) framework of analytical electron ptychography can account for the presence of residual geometrical aberrations induced by the probe-forming lens. However, the accuracy of this aberration correction method is highly sensitive to noise, in part due to the necessity of phase unwrapping. In this work, we thus propose two strategies to improve aberration correction performance in low-dose conditions: confining phase unwrapping within the sidebands and selecting only well-unwrapped sidebands for calculating aberration coefficients. These strategies are validated through SSB reconstructions of both simulated and experimental 4D-STEM datasets of monolayer tungsten diselenide (WSe2). A comparison of results demonstrates significant improvements in Poisson noise tolerance, making aberration correction more robust and reliable for low-dose imaging.
title Improving the low-dose performance of aberration correction in single sideband ptychography
topic Applied Physics
url https://arxiv.org/abs/2505.09555