Simulation of charge transport at the surface of planar silicon sensors

Fuente: arXiv
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Main Authors: Bloch, Ingo, Bruers, Ben, Lacker, Heiko, Li, Peilin, Ninca, Ilona, Scharf, Christian
Format: Preprint
Published: 2025
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_version_ 1866916746181476352
author Bloch, Ingo
Bruers, Ben
Lacker, Heiko
Li, Peilin
Ninca, Ilona
Scharf, Christian
author_facet Bloch, Ingo
Bruers, Ben
Lacker, Heiko
Li, Peilin
Ninca, Ilona
Scharf, Christian
contents Radiation-hard silicon sensors used in high-energy physics require a high electric field and are susceptible to surface breakdown. This study aims to improve the understanding of the underlying mechanisms by developing new methods to probe the electric field at surface near the sensor's edge. For planar sensors, avalanche breakdown primarily occurs at the Si-SiO2 interface, where localized electric field peaks can form between the guard ring and the edge. Accurate simulations are challenging and it is essential to validate simulation parameters by comparing the simulation results to measurements. In this work, the electrical behavior of the edge region of planar silicon diodes was simulated using Synopsis TCAD. Transient Current Technique (TCT) simulations were performed in both TCAD and Allpix Squared, and compared to measurements. Additionally, laser scans over the edge region were performed in Allpix Squared to evaluate the simulated surface electric field and charge collection efficiency.
format Preprint
id arxiv_https___arxiv_org_abs_2505_14203
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Simulation of charge transport at the surface of planar silicon sensors
Bloch, Ingo
Bruers, Ben
Lacker, Heiko
Li, Peilin
Ninca, Ilona
Scharf, Christian
Instrumentation and Detectors
Radiation-hard silicon sensors used in high-energy physics require a high electric field and are susceptible to surface breakdown. This study aims to improve the understanding of the underlying mechanisms by developing new methods to probe the electric field at surface near the sensor's edge. For planar sensors, avalanche breakdown primarily occurs at the Si-SiO2 interface, where localized electric field peaks can form between the guard ring and the edge. Accurate simulations are challenging and it is essential to validate simulation parameters by comparing the simulation results to measurements. In this work, the electrical behavior of the edge region of planar silicon diodes was simulated using Synopsis TCAD. Transient Current Technique (TCT) simulations were performed in both TCAD and Allpix Squared, and compared to measurements. Additionally, laser scans over the edge region were performed in Allpix Squared to evaluate the simulated surface electric field and charge collection efficiency.
title Simulation of charge transport at the surface of planar silicon sensors
topic Instrumentation and Detectors
url https://arxiv.org/abs/2505.14203