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Bibliographic Details
Main Authors: Nakayam, Kazuya, Yasui, Takanari
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2505.18678
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_version_ 1866910025170026496
author Nakayam, Kazuya
Yasui, Takanari
author_facet Nakayam, Kazuya
Yasui, Takanari
contents UVA to NIR with multi-directional photo responses have been found on metal (Au)/n-Si device. A reasonable explanation has not been found in various physical models of Si-devices for the phenomena. We approached a zero-gap at X (reciprocal point) in two conduction bands of Si to analysis the optical response with the inter-band phonon scatterings. The calculation of the quantum efficiency between X-$Γ$ and X-W successfully simulated the sensitivities in visible region (1.1 to 2.0 eV), the carrier density profile well fitted the response in NIR (0.6 to 1.0 eV). Filling up the zero-gap by doping electrons ($\sim 10^{18}$/cm$^3$) at around X, a lower limit of 0.6 eV arose in the measurement below Si-band gap of 1.17 eV. Indirect/direct transitions of inter conduction bands: X-W, X-K and $Γ$-L in the 1st Brillouin Zone/Van Hove singularity at L point, synchronizing with phonon scattering, gave a variety of directional photo-responses. The carrier scattering model for the inter bands (X-W, X-K and $Γ$-L) were consistent with the directional dependence of photo-currents under UVA (3.4 eV) and Visible (3.06 eV) excitations. Band to band scatterings assisted to extend the available optical range and increase its variety of directional responses. Utilizing this principle, a new frontier will be opened in the photo-conversion system by using indirect-transition semiconductors and thus, it will be released from those band gaps and directivity limitations.
format Preprint
id arxiv_https___arxiv_org_abs_2505_18678
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle The extensive photo response on metal/n-Si clarified by the zero-gap with inter-band phonon scatterings
Nakayam, Kazuya
Yasui, Takanari
Other Condensed Matter
Materials Science
UVA to NIR with multi-directional photo responses have been found on metal (Au)/n-Si device. A reasonable explanation has not been found in various physical models of Si-devices for the phenomena. We approached a zero-gap at X (reciprocal point) in two conduction bands of Si to analysis the optical response with the inter-band phonon scatterings. The calculation of the quantum efficiency between X-$Γ$ and X-W successfully simulated the sensitivities in visible region (1.1 to 2.0 eV), the carrier density profile well fitted the response in NIR (0.6 to 1.0 eV). Filling up the zero-gap by doping electrons ($\sim 10^{18}$/cm$^3$) at around X, a lower limit of 0.6 eV arose in the measurement below Si-band gap of 1.17 eV. Indirect/direct transitions of inter conduction bands: X-W, X-K and $Γ$-L in the 1st Brillouin Zone/Van Hove singularity at L point, synchronizing with phonon scattering, gave a variety of directional photo-responses. The carrier scattering model for the inter bands (X-W, X-K and $Γ$-L) were consistent with the directional dependence of photo-currents under UVA (3.4 eV) and Visible (3.06 eV) excitations. Band to band scatterings assisted to extend the available optical range and increase its variety of directional responses. Utilizing this principle, a new frontier will be opened in the photo-conversion system by using indirect-transition semiconductors and thus, it will be released from those band gaps and directivity limitations.
title The extensive photo response on metal/n-Si clarified by the zero-gap with inter-band phonon scatterings
topic Other Condensed Matter
Materials Science
url https://arxiv.org/abs/2505.18678