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Auger parameter analysis for TiN and AlN thin films via combined in-situ XPS and HAXPES

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Pshyk, O. V., Patidar, J., Cancellieri, C., Siol, S.
Formato:	Preprint
Publicado:	2025
Materias:	Materials Science
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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