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Main Authors: Zambito, G., Ferrando, G., Barelli, M., Ceccardi, M., Caglieris, F., Marre, D., Bisio, F., de Mongeot, F. B., Giordano, M. C.
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2505.24020
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author Zambito, G.
Ferrando, G.
Barelli, M.
Ceccardi, M.
Caglieris, F.
Marre, D.
Bisio, F.
de Mongeot, F. B.
Giordano, M. C.
author_facet Zambito, G.
Ferrando, G.
Barelli, M.
Ceccardi, M.
Caglieris, F.
Marre, D.
Bisio, F.
de Mongeot, F. B.
Giordano, M. C.
contents Nanoscale tailoring of the optoelectronic response of 2D Transition Metal Dichalcogenides semiconductor layers (TMDs) has been achieved thanks to a novel strain engineering approach based on the grayscale thermal-Scanning Probe Lithography (t-SPL). This method allows the maskless nanofabrication of locally strained 2D MoS2-Au lateral heterojunction nanoarrays that are characterized by asymmetric electrical behavior. 2D MoS2 layers are conformally transferred onto grayscale t-SPL templates characterized by periodic nanoarrays of deterministic faceted nanoridges. This peculiar morphology induces asymmetric and uniaxial strain accumulation in the 2D TMD material allowing to tailor their electrical work-function at the nanoscale level, as demonstrated by Kelvin Probe Force Microscopy (KPFM). The modulation of the electronic response has been exploited to develop periodic nanoarrays of lateral heterojunctions endowed with asymmetric electrical response by simple maskless deposition of Au nanocontacts onto the strained 2D TMD layers. The locally strained Au-MoS2 layers show asymmetric lateral heterojunctions with engineered carrier extraction functionalities, thus representing a promising platform in view of tunable ultrathin nanoelectronic, nanophotonic and sensing applications.
format Preprint
id arxiv_https___arxiv_org_abs_2505_24020
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Strained 2D TMD lateral heterojunctions via grayscale thermal-Scanning Probe Lithography
Zambito, G.
Ferrando, G.
Barelli, M.
Ceccardi, M.
Caglieris, F.
Marre, D.
Bisio, F.
de Mongeot, F. B.
Giordano, M. C.
Mesoscale and Nanoscale Physics
Nanoscale tailoring of the optoelectronic response of 2D Transition Metal Dichalcogenides semiconductor layers (TMDs) has been achieved thanks to a novel strain engineering approach based on the grayscale thermal-Scanning Probe Lithography (t-SPL). This method allows the maskless nanofabrication of locally strained 2D MoS2-Au lateral heterojunction nanoarrays that are characterized by asymmetric electrical behavior. 2D MoS2 layers are conformally transferred onto grayscale t-SPL templates characterized by periodic nanoarrays of deterministic faceted nanoridges. This peculiar morphology induces asymmetric and uniaxial strain accumulation in the 2D TMD material allowing to tailor their electrical work-function at the nanoscale level, as demonstrated by Kelvin Probe Force Microscopy (KPFM). The modulation of the electronic response has been exploited to develop periodic nanoarrays of lateral heterojunctions endowed with asymmetric electrical response by simple maskless deposition of Au nanocontacts onto the strained 2D TMD layers. The locally strained Au-MoS2 layers show asymmetric lateral heterojunctions with engineered carrier extraction functionalities, thus representing a promising platform in view of tunable ultrathin nanoelectronic, nanophotonic and sensing applications.
title Strained 2D TMD lateral heterojunctions via grayscale thermal-Scanning Probe Lithography
topic Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2505.24020