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Self-ion implantation and structural relaxation in amorphous silicon

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Gibson, J. M., Elliman, Robe, Susi, T., Mangler, C.
Formato:	Preprint
Publicado:	2025
Materias:	Materials Science Applied Physics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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