R2SM: Referring and Reasoning for Selective Masks

Fuente: arXiv

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Bibliographic Details
Main Authors:	Shih, Yu-Lin, Tai, Wei-En, Sun, Cheng, Wang, Yu-Chiang Frank, Chen, Hwann-Tzong
Format:	Preprint
Published:	2025
Subjects:	Computer Vision and Pattern Recognition
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2506.01795