Concentration profiles of OH and H$_2$O$_2$ in plasma-treated water: influence of power, gas mixture and treatment distance

Fuente: arXiv

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Bibliographic Details
Main Authors:	Schöne, Anna Lena, Schüttler, Steffen, Mroß, Talisha, Eichstaedt, Niklas, Golda, Judith, Schücke, Lars, Gibson, Andrew R.
Format:	Preprint
Published:	2025
Subjects:	Plasma Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2506.03886