Si Intercalation Beneath Epitaxial Graphene: Modulating Mott States at the SiC(0001) Interface

Fuente: arXiv
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Auteurs principaux: Tilgner, Niclas, Mamiyev, Zamin, Wolff, Susanne, Schädlich, Philip, Göhler, Fabian, Tegenkamp, Christoph, Seyller, Thomas
Format: Preprint
Publié: 2025
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author Tilgner, Niclas
Mamiyev, Zamin
Wolff, Susanne
Schädlich, Philip
Göhler, Fabian
Tegenkamp, Christoph
Seyller, Thomas
author_facet Tilgner, Niclas
Mamiyev, Zamin
Wolff, Susanne
Schädlich, Philip
Göhler, Fabian
Tegenkamp, Christoph
Seyller, Thomas
contents Intercalation has proven to be a powerful tool for tailoring the electronic properties of freestanding graphene layers as well as for stabilizing the intercalated material in a two-dimensional configuration. This work examines Si intercalation of epitaxial graphene on SiC(0001) using three preparation methods. Dangling bond states at the interface were found to undergo a Mott-Hubbard metal-insulator transition as a result of a significant on-site repulsion. Comparing this heterostructure consisting of graphene and a Mott insulator with a similar system without graphene, reveals the screening ability of graphene's conduction electrons on the on-site repulsion. The system presented here can serve as a template for further research on Mott insulators with variable band gap.
format Preprint
id arxiv_https___arxiv_org_abs_2506_07545
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Si Intercalation Beneath Epitaxial Graphene: Modulating Mott States at the SiC(0001) Interface
Tilgner, Niclas
Mamiyev, Zamin
Wolff, Susanne
Schädlich, Philip
Göhler, Fabian
Tegenkamp, Christoph
Seyller, Thomas
Materials Science
Intercalation has proven to be a powerful tool for tailoring the electronic properties of freestanding graphene layers as well as for stabilizing the intercalated material in a two-dimensional configuration. This work examines Si intercalation of epitaxial graphene on SiC(0001) using three preparation methods. Dangling bond states at the interface were found to undergo a Mott-Hubbard metal-insulator transition as a result of a significant on-site repulsion. Comparing this heterostructure consisting of graphene and a Mott insulator with a similar system without graphene, reveals the screening ability of graphene's conduction electrons on the on-site repulsion. The system presented here can serve as a template for further research on Mott insulators with variable band gap.
title Si Intercalation Beneath Epitaxial Graphene: Modulating Mott States at the SiC(0001) Interface
topic Materials Science
url https://arxiv.org/abs/2506.07545