Surrogate models to optimize plasma assisted atomic layer deposition in high aspect ratio features

Fuente: arXiv

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Bibliographic Details
Main Authors:	Yanguas-Gil, Angel, Elam, Jeffrey W.
Format:	Preprint
Published:	2025
Subjects:	Materials Science Machine Learning Plasma Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2506.09313