Fabrication of airbridges with gradient exposure
Fuente:
arXiv
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| Autori principali: | , , , , , , , , |
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| Natura: | Preprint |
| Pubblicazione: |
2025
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| Soggetti: | |
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| _version_ | 1866912436310769664 |
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| author | Sun, Yuting Ding, Jiayu Xia, Xiaoyu Wang, Xiaohan Xu, Jianwen Song, Shuqing Lan, Dong Zhao, Jie Yu, Yang |
| author_facet | Sun, Yuting Ding, Jiayu Xia, Xiaoyu Wang, Xiaohan Xu, Jianwen Song, Shuqing Lan, Dong Zhao, Jie Yu, Yang |
| contents | In superconducting quantum circuits, airbridges are critical for eliminating parasitic slotline modes of coplanar waveguide circuits and reducing crosstalks between direct current magnetic flux biases. Here, we present a technique for fabricating superconducting airbridges. With this technique, a single layer of photoresist is employed, and the gradient exposure process is used to define the profile of airbridges. In order to properly obtain the bridge profile, we design exposure dosage based on residual photoresist thickness and laser power calibrations. Compared with other airbridge fabrication techniques, the gradient exposure fabrication technique provides the ability to produce lossless superconducting airbridges with flexible size and, thus, is more suitable for large-scale superconducting quantum circuits. Furthermore, this method reduces the complexity of the fabrication process and provides a high fabrication yield. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2506_14565 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Fabrication of airbridges with gradient exposure Sun, Yuting Ding, Jiayu Xia, Xiaoyu Wang, Xiaohan Xu, Jianwen Song, Shuqing Lan, Dong Zhao, Jie Yu, Yang Quantum Physics Applied Physics In superconducting quantum circuits, airbridges are critical for eliminating parasitic slotline modes of coplanar waveguide circuits and reducing crosstalks between direct current magnetic flux biases. Here, we present a technique for fabricating superconducting airbridges. With this technique, a single layer of photoresist is employed, and the gradient exposure process is used to define the profile of airbridges. In order to properly obtain the bridge profile, we design exposure dosage based on residual photoresist thickness and laser power calibrations. Compared with other airbridge fabrication techniques, the gradient exposure fabrication technique provides the ability to produce lossless superconducting airbridges with flexible size and, thus, is more suitable for large-scale superconducting quantum circuits. Furthermore, this method reduces the complexity of the fabrication process and provides a high fabrication yield. |
| title | Fabrication of airbridges with gradient exposure |
| topic | Quantum Physics Applied Physics |
| url | https://arxiv.org/abs/2506.14565 |