Design of an all-facet illuminator for high NA EUV lithography exposure tool based on deep reinforcement learning

Fuente: arXiv

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Bibliographic Details
Main Authors:	Li, Tong, Chen, Yuqing, Li, Yanqiu, Liu, Lihui
Format:	Preprint
Published:	2025
Subjects:	Optics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2506.15558