Copertina

Design of an all-facet illuminator for high NA EUV lithography exposure tool based on deep reinforcement learning

Fuente: arXiv

Salvato in:

Dettagli Bibliografici
Autori principali:	Li, Tong, Chen, Yuqing, Li, Yanqiu, Liu, Lihui
Natura:	Preprint
Pubblicazione:	2025
Soggetti:	Optics
Accesso online:	Acceder al recurso
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