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Design of an all-facet illuminator for high NA EUV lithography exposure tool based on deep reinforcement learning

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Li, Tong, Chen, Yuqing, Li, Yanqiu, Liu, Lihui
Formato:	Preprint
Publicado:	2025
Materias:	Optics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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