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Autori principali: Marciaga, Gabriel, Li, Jian-Sian, Chiang, Chao-Ching, Ren, Fan, Pearton, Stephen J., Sartel, Corinne, Chi, Zeyu, Dumont, Yves, Chikoidze, Ekaterine, Schulte, Alfons, Ruzin, Arie, Chernyak, Leonid
Natura: Preprint
Pubblicazione: 2025
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Accesso online:https://arxiv.org/abs/2506.17398
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author Marciaga, Gabriel
Li, Jian-Sian
Chiang, Chao-Ching
Ren, Fan
Pearton, Stephen J.
Sartel, Corinne
Chi, Zeyu
Dumont, Yves
Chikoidze, Ekaterine
Schulte, Alfons
Ruzin, Arie
Chernyak, Leonid
author_facet Marciaga, Gabriel
Li, Jian-Sian
Chiang, Chao-Ching
Ren, Fan
Pearton, Stephen J.
Sartel, Corinne
Chi, Zeyu
Dumont, Yves
Chikoidze, Ekaterine
Schulte, Alfons
Ruzin, Arie
Chernyak, Leonid
contents This study investigates minority electron diffusion length and carrier recombination phenomena within p-type, 300 nm-thick Ga2O3 epitaxial films. Utilizing Electron Beam-Induced Current (EBIC) and Cathodoluminescence (CL) spectroscopy, these characteristics were examined as a function of both temperature and the duration of electron beam excitation. While the electron diffusion length in these p-Ga2O3 films diminish with increasing temperature, a continuous electron beam excitation of a particular location on the surface of a p-Ga2O3 epitaxial layer leads to an elongation of the diffusion length. and decay of cathodoluminescence intensity in that location under beam exposure. These latter two effects are attributed to non-equilibrium electrons, generated by an electron beam, being captured at acceptor-related point defect levels in Gallium Oxide. The activation energies characterizing these processes were obtained from the independent EBIC and CL experiments to garner insight into defect landscape and its influence on transport and recombination dynamics.
format Preprint
id arxiv_https___arxiv_org_abs_2506_17398
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Electron beam irradiation-induced transport and recombination in p-type Gallium Oxide grown on (001) \b{eta}-Ga2O3 substrate
Marciaga, Gabriel
Li, Jian-Sian
Chiang, Chao-Ching
Ren, Fan
Pearton, Stephen J.
Sartel, Corinne
Chi, Zeyu
Dumont, Yves
Chikoidze, Ekaterine
Schulte, Alfons
Ruzin, Arie
Chernyak, Leonid
Materials Science
Applied Physics
This study investigates minority electron diffusion length and carrier recombination phenomena within p-type, 300 nm-thick Ga2O3 epitaxial films. Utilizing Electron Beam-Induced Current (EBIC) and Cathodoluminescence (CL) spectroscopy, these characteristics were examined as a function of both temperature and the duration of electron beam excitation. While the electron diffusion length in these p-Ga2O3 films diminish with increasing temperature, a continuous electron beam excitation of a particular location on the surface of a p-Ga2O3 epitaxial layer leads to an elongation of the diffusion length. and decay of cathodoluminescence intensity in that location under beam exposure. These latter two effects are attributed to non-equilibrium electrons, generated by an electron beam, being captured at acceptor-related point defect levels in Gallium Oxide. The activation energies characterizing these processes were obtained from the independent EBIC and CL experiments to garner insight into defect landscape and its influence on transport and recombination dynamics.
title Electron beam irradiation-induced transport and recombination in p-type Gallium Oxide grown on (001) \b{eta}-Ga2O3 substrate
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2506.17398