Atomic layer deposition on particulate materials from 1988 through 2023: A quantitative review of technologies, materials and applications

Fuente: arXiv

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Bibliographic Details
Main Authors:	Piechulla, Peter M., Chen, Mingliang, Goulas, Aristeidis, Puurunen, Riikka L., van Ommen, J. Ruud
Format:	Preprint
Published:	2025
Subjects:	Materials Science Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2506.17725