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Atomic layer deposition on particulate materials from 1988 through 2023: A quantitative review of technologies, materials and applications

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Piechulla, Peter M., Chen, Mingliang, Goulas, Aristeidis, Puurunen, Riikka L., van Ommen, J. Ruud
Natura:	Preprint
Pubblicazione:	2025
Soggetti:	Materials Science Applied Physics
Accesso online:	Acceder al recurso
Tags:	Aggiungi Tag Nessun Tag, puoi essere il primo ad aggiungerne!!

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