LPCVD based Plasma Damage Free in situ etching of $β$-Ga$_2$O$_3$ using Solid Source Gallium

Fuente: arXiv

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Bibliographic Details
Main Authors:	Khan, Saleh Ahmed, Ibreljic, Ahmed, Bhuiyan, A F M Anhar Uddin
Format:	Preprint
Published:	2025
Subjects:	Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2506.17855