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LPCVD based Plasma Damage Free in situ etching of $β$-Ga$_2$O$_3$ using Solid Source Gallium

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Khan, Saleh Ahmed, Ibreljic, Ahmed, Bhuiyan, A F M Anhar Uddin
Natura:	Preprint
Pubblicazione:	2025
Soggetti:	Applied Physics
Accesso online:	Acceder al recurso
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