High-Performance Ultra-Wide-Bandgap CaSnO3 Metal-Oxide-Semiconductor Field-Effect Transistors

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Hauptverfasser: Sun, Weideng, Koo, Junghyun, Kim, Donghwan, Lee, Hongseung, Raj, Rishi, Zhu, Chengyu, Lee, Kiyoung, Mkhoyan, Andre, Bae, Hagyoul, Jalan, Bharat, Qiu, Gang
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Veröffentlicht: 2025
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author Sun, Weideng
Koo, Junghyun
Kim, Donghwan
Lee, Hongseung
Raj, Rishi
Zhu, Chengyu
Lee, Kiyoung
Mkhoyan, Andre
Bae, Hagyoul
Jalan, Bharat
Qiu, Gang
author_facet Sun, Weideng
Koo, Junghyun
Kim, Donghwan
Lee, Hongseung
Raj, Rishi
Zhu, Chengyu
Lee, Kiyoung
Mkhoyan, Andre
Bae, Hagyoul
Jalan, Bharat
Qiu, Gang
contents The increasing demand for high-voltage and high-power electronic applications has intensified the search for novel ultrawide bandgap (UWB) semiconductors. Alkaline earth stannates possess wide band gaps and exhibit the highest room-temperature electron mobilities among all perovskite oxides. Among this family, Calcium stannate (CaSnO3) has the largest band gap of ~4.7 eV, holding great promise for high-power applications. However, the demonstration of CaSnO3 power electronic devices is so far limited. In this work, high-performance metal-oxide-semiconductor field-effect transistor (MOSFET) devices based on La-doped CaSnO3 are demonstrated for the first time. The MOSFETs exhibit an on/off ratio exceeding 10^8, along with field-effect mobility of 8.4 cm2 V-1 s-1 and on-state current of 30 mA mm-1. The high performance of the CaSnO3 MOSFET devices can be ascribed to the excellent metal-to-semiconductor contact resistance of 0.73 kΩμm. The devices also show great potential for harsh environment operations, as high-temperature operations up to 400 K have been demonstrated. An off-state breakdown voltage of 1660 V is achieved, with a breakdown field of ~8.3 MV cm-1 among the highest reported for all UWB semiconductors. This work represents significant progress toward realizing the practical application of CaSnO3 in future high-voltage power electronic technologies.
format Preprint
id arxiv_https___arxiv_org_abs_2506_23973
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle High-Performance Ultra-Wide-Bandgap CaSnO3 Metal-Oxide-Semiconductor Field-Effect Transistors
Sun, Weideng
Koo, Junghyun
Kim, Donghwan
Lee, Hongseung
Raj, Rishi
Zhu, Chengyu
Lee, Kiyoung
Mkhoyan, Andre
Bae, Hagyoul
Jalan, Bharat
Qiu, Gang
Materials Science
Applied Physics
The increasing demand for high-voltage and high-power electronic applications has intensified the search for novel ultrawide bandgap (UWB) semiconductors. Alkaline earth stannates possess wide band gaps and exhibit the highest room-temperature electron mobilities among all perovskite oxides. Among this family, Calcium stannate (CaSnO3) has the largest band gap of ~4.7 eV, holding great promise for high-power applications. However, the demonstration of CaSnO3 power electronic devices is so far limited. In this work, high-performance metal-oxide-semiconductor field-effect transistor (MOSFET) devices based on La-doped CaSnO3 are demonstrated for the first time. The MOSFETs exhibit an on/off ratio exceeding 10^8, along with field-effect mobility of 8.4 cm2 V-1 s-1 and on-state current of 30 mA mm-1. The high performance of the CaSnO3 MOSFET devices can be ascribed to the excellent metal-to-semiconductor contact resistance of 0.73 kΩμm. The devices also show great potential for harsh environment operations, as high-temperature operations up to 400 K have been demonstrated. An off-state breakdown voltage of 1660 V is achieved, with a breakdown field of ~8.3 MV cm-1 among the highest reported for all UWB semiconductors. This work represents significant progress toward realizing the practical application of CaSnO3 in future high-voltage power electronic technologies.
title High-Performance Ultra-Wide-Bandgap CaSnO3 Metal-Oxide-Semiconductor Field-Effect Transistors
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2506.23973