Ab-initio-NEGF Fundamental Roadmap for Carbon-Nanotube and Two-Dimensional-Material MOSFETs at the Scaling and VDD Limit

Fuente: arXiv
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Autore principale: Afzalian, Aryan
Natura: Preprint
Pubblicazione: 2025
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author Afzalian, Aryan
author_facet Afzalian, Aryan
contents Using accurate Hybrid-Functional DFT coupled with the Non-Equilibrium Green's function (NEGF) formalism, we explore and benchmark the fundamental scaling limits of CNT-FETs against Si and 2D-material MoS$_2$ and HfS$_2$ Nanosheets, highlighting their potential for gate length (L) and supply voltage (VDD) scaling down to 5 nm and to 0.5 V, respectively. The highest drive current is achieved by CNT-FETs with sub 1.3 nm diameters down to $L = 9$ nm and using VDD in the 0.45-0.5V range. Below $L = 9$ nm, however, the HfS$_2$ NS offers the best drive and could further scale down to $L = 5$ nm with a reduced VDD of 0.5 V.
format Preprint
id arxiv_https___arxiv_org_abs_2507_00599
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Ab-initio-NEGF Fundamental Roadmap for Carbon-Nanotube and Two-Dimensional-Material MOSFETs at the Scaling and VDD Limit
Afzalian, Aryan
Mesoscale and Nanoscale Physics
Applied Physics
Using accurate Hybrid-Functional DFT coupled with the Non-Equilibrium Green's function (NEGF) formalism, we explore and benchmark the fundamental scaling limits of CNT-FETs against Si and 2D-material MoS$_2$ and HfS$_2$ Nanosheets, highlighting their potential for gate length (L) and supply voltage (VDD) scaling down to 5 nm and to 0.5 V, respectively. The highest drive current is achieved by CNT-FETs with sub 1.3 nm diameters down to $L = 9$ nm and using VDD in the 0.45-0.5V range. Below $L = 9$ nm, however, the HfS$_2$ NS offers the best drive and could further scale down to $L = 5$ nm with a reduced VDD of 0.5 V.
title Ab-initio-NEGF Fundamental Roadmap for Carbon-Nanotube and Two-Dimensional-Material MOSFETs at the Scaling and VDD Limit
topic Mesoscale and Nanoscale Physics
Applied Physics
url https://arxiv.org/abs/2507.00599