Synthesis and transport properties of epitaxial Bi (111) films on GaAs (111) substrates

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Hauptverfasser: Jena, Jagannath, Ark, Eugene D., Ambhire, Siddhesh, Smith, Michael D., Wood, Justin S., Yang, Junyi, Pearson, John, Arava, Hanu, Rosenmann, Daniel, Welp, Ulrich, Jiang, Jidong S., Hong, Deshun, Martin, Ivar, Zhang, Steven S. -L., Bhattacharya, Anand
Format: Preprint
Veröffentlicht: 2025
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author Jena, Jagannath
Ark, Eugene D.
Ambhire, Siddhesh
Smith, Michael D.
Wood, Justin S.
Yang, Junyi
Pearson, John
Arava, Hanu
Rosenmann, Daniel
Welp, Ulrich
Jiang, Jidong S.
Hong, Deshun
Martin, Ivar
Zhang, Steven S. -L.
Bhattacharya, Anand
author_facet Jena, Jagannath
Ark, Eugene D.
Ambhire, Siddhesh
Smith, Michael D.
Wood, Justin S.
Yang, Junyi
Pearson, John
Arava, Hanu
Rosenmann, Daniel
Welp, Ulrich
Jiang, Jidong S.
Hong, Deshun
Martin, Ivar
Zhang, Steven S. -L.
Bhattacharya, Anand
contents In recent decades, the growth of ultrathin epitaxial bismuth (Bi) films on various substrates has garnered interest due to their unique electronic properties. We report upon the growth and electrical transport properties of epitaxial Bi (111) films in the thickness range of 5-32 nm deposited directly on GaAs (111) substrates, without a buffer layer. The quality of Bi films is found to depend on conditions for substrate treatment using Ar+ ion-milling and annealing. Substrates milled at low ion beam currents display poor surface reconstruction after annealing, which hinders the growth of high-quality films. In contrast, substrates milled under optimized conditions led to reconstructed surfaces upon annealing, resulting in epitaxial Bi films with predominantly single-domain orientation. Although epitaxial films formed in both cases, transport measurements indicated significantly higher conductivity for films grown on optimally treated substrates. Measurements at low temperatures suggest that the transport properties are dominated by a surface state with high mobility electrons. Magneto-transport measurements suggest that conductivity and mobility improve progressively with increasing film thickness. For the thinnest 5 nm film, a hole-like state emerges, presumably as the electron-like state is gapped out. These results provide a robust methodology for growing high-quality epitaxial Bi films on GaAs (111) and offer insights into their unique transport properties, and our ability to tune them.
format Preprint
id arxiv_https___arxiv_org_abs_2507_03301
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Synthesis and transport properties of epitaxial Bi (111) films on GaAs (111) substrates
Jena, Jagannath
Ark, Eugene D.
Ambhire, Siddhesh
Smith, Michael D.
Wood, Justin S.
Yang, Junyi
Pearson, John
Arava, Hanu
Rosenmann, Daniel
Welp, Ulrich
Jiang, Jidong S.
Hong, Deshun
Martin, Ivar
Zhang, Steven S. -L.
Bhattacharya, Anand
Materials Science
Mesoscale and Nanoscale Physics
In recent decades, the growth of ultrathin epitaxial bismuth (Bi) films on various substrates has garnered interest due to their unique electronic properties. We report upon the growth and electrical transport properties of epitaxial Bi (111) films in the thickness range of 5-32 nm deposited directly on GaAs (111) substrates, without a buffer layer. The quality of Bi films is found to depend on conditions for substrate treatment using Ar+ ion-milling and annealing. Substrates milled at low ion beam currents display poor surface reconstruction after annealing, which hinders the growth of high-quality films. In contrast, substrates milled under optimized conditions led to reconstructed surfaces upon annealing, resulting in epitaxial Bi films with predominantly single-domain orientation. Although epitaxial films formed in both cases, transport measurements indicated significantly higher conductivity for films grown on optimally treated substrates. Measurements at low temperatures suggest that the transport properties are dominated by a surface state with high mobility electrons. Magneto-transport measurements suggest that conductivity and mobility improve progressively with increasing film thickness. For the thinnest 5 nm film, a hole-like state emerges, presumably as the electron-like state is gapped out. These results provide a robust methodology for growing high-quality epitaxial Bi films on GaAs (111) and offer insights into their unique transport properties, and our ability to tune them.
title Synthesis and transport properties of epitaxial Bi (111) films on GaAs (111) substrates
topic Materials Science
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2507.03301