Implantation studies of low-energy positive muons in niobium thin films
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| Main Authors: | , , , , , , , |
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| Format: | Preprint |
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2025
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| _version_ | 1866912727189946368 |
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| author | McFadden, Ryan M. L. Suter, Andreas Ruf, Leon Di Bernardo, Angelo Müller, Arnold M. Prokscha, Thomas Salman, Zaher Junginger, Tobias |
| author_facet | McFadden, Ryan M. L. Suter, Andreas Ruf, Leon Di Bernardo, Angelo Müller, Arnold M. Prokscha, Thomas Salman, Zaher Junginger, Tobias |
| contents | Here we study the range of keV positive muons $μ^+$ implanted in Nb$_2$O$_5$($x$ nm)/Nb($y$ nm)/SiO$_2$(300 nm)/Si [$x$ = 3.6 nm, 3.3 nm; $y$ = 42.0 nm, 60.1 nm] thin films using low-energy muon spin spectroscopy (LE-$μ$SR). At implantation energies 1.3 keV $\leq E \leq$ 23.3 keV, we compare the measured diamagnetic $μ^+$ signal fraction $f_{\mathrm{dia.}}$ against predictions derived from implantation profile simulations using the TRIM.SP Monte Carlo code. Treating the implanted $μ^+$ as light protons, we find that simulations making use of updated stopping cross section data are in good agreement with the LE-$μ$SR measurements, in contrast to parameterizations found in earlier tabulations. Implications for other studies relying on accurate $μ^+$ stopping information are discussed. |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2507_03785 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Implantation studies of low-energy positive muons in niobium thin films McFadden, Ryan M. L. Suter, Andreas Ruf, Leon Di Bernardo, Angelo Müller, Arnold M. Prokscha, Thomas Salman, Zaher Junginger, Tobias Materials Science Mesoscale and Nanoscale Physics Applied Physics Here we study the range of keV positive muons $μ^+$ implanted in Nb$_2$O$_5$($x$ nm)/Nb($y$ nm)/SiO$_2$(300 nm)/Si [$x$ = 3.6 nm, 3.3 nm; $y$ = 42.0 nm, 60.1 nm] thin films using low-energy muon spin spectroscopy (LE-$μ$SR). At implantation energies 1.3 keV $\leq E \leq$ 23.3 keV, we compare the measured diamagnetic $μ^+$ signal fraction $f_{\mathrm{dia.}}$ against predictions derived from implantation profile simulations using the TRIM.SP Monte Carlo code. Treating the implanted $μ^+$ as light protons, we find that simulations making use of updated stopping cross section data are in good agreement with the LE-$μ$SR measurements, in contrast to parameterizations found in earlier tabulations. Implications for other studies relying on accurate $μ^+$ stopping information are discussed. |
| title | Implantation studies of low-energy positive muons in niobium thin films |
| topic | Materials Science Mesoscale and Nanoscale Physics Applied Physics |
| url | https://arxiv.org/abs/2507.03785 |