Generate Aligned Anomaly: Region-Guided Few-Shot Anomaly Image-Mask Pair Synthesis for Industrial Inspection

Fuente: arXiv
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Autori principali: Lu, Yilin, Lin, Jianghang, Xie, Linhuang, Zhao, Kai, Qu, Yansong, Zhang, Shengchuan, Cao, Liujuan, Ji, Rongrong
Natura: Preprint
Pubblicazione: 2025
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author Lu, Yilin
Lin, Jianghang
Xie, Linhuang
Zhao, Kai
Qu, Yansong
Zhang, Shengchuan
Cao, Liujuan
Ji, Rongrong
author_facet Lu, Yilin
Lin, Jianghang
Xie, Linhuang
Zhao, Kai
Qu, Yansong
Zhang, Shengchuan
Cao, Liujuan
Ji, Rongrong
contents Anomaly inspection plays a vital role in industrial manufacturing, but the scarcity of anomaly samples significantly limits the effectiveness of existing methods in tasks such as localization and classification. While several anomaly synthesis approaches have been introduced for data augmentation, they often struggle with low realism, inaccurate mask alignment, and poor generalization. To overcome these limitations, we propose Generate Aligned Anomaly (GAA), a region-guided, few-shot anomaly image-mask pair generation framework. GAA leverages the strong priors of a pretrained latent diffusion model to generate realistic, diverse, and semantically aligned anomalies using only a small number of samples. The framework first employs Localized Concept Decomposition to jointly model the semantic features and spatial information of anomalies, enabling flexible control over the type and location of anomalies. It then utilizes Adaptive Multi-Round Anomaly Clustering to perform fine-grained semantic clustering of anomaly concepts, thereby enhancing the consistency of anomaly representations. Subsequently, a region-guided mask generation strategy ensures precise alignment between anomalies and their corresponding masks, while a low-quality sample filtering module is introduced to further improve the overall quality of the generated samples. Extensive experiments on the MVTec AD and LOCO datasets demonstrate that GAA achieves superior performance in both anomaly synthesis quality and downstream tasks such as localization and classification.
format Preprint
id arxiv_https___arxiv_org_abs_2507_09619
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Generate Aligned Anomaly: Region-Guided Few-Shot Anomaly Image-Mask Pair Synthesis for Industrial Inspection
Lu, Yilin
Lin, Jianghang
Xie, Linhuang
Zhao, Kai
Qu, Yansong
Zhang, Shengchuan
Cao, Liujuan
Ji, Rongrong
Computer Vision and Pattern Recognition
Anomaly inspection plays a vital role in industrial manufacturing, but the scarcity of anomaly samples significantly limits the effectiveness of existing methods in tasks such as localization and classification. While several anomaly synthesis approaches have been introduced for data augmentation, they often struggle with low realism, inaccurate mask alignment, and poor generalization. To overcome these limitations, we propose Generate Aligned Anomaly (GAA), a region-guided, few-shot anomaly image-mask pair generation framework. GAA leverages the strong priors of a pretrained latent diffusion model to generate realistic, diverse, and semantically aligned anomalies using only a small number of samples. The framework first employs Localized Concept Decomposition to jointly model the semantic features and spatial information of anomalies, enabling flexible control over the type and location of anomalies. It then utilizes Adaptive Multi-Round Anomaly Clustering to perform fine-grained semantic clustering of anomaly concepts, thereby enhancing the consistency of anomaly representations. Subsequently, a region-guided mask generation strategy ensures precise alignment between anomalies and their corresponding masks, while a low-quality sample filtering module is introduced to further improve the overall quality of the generated samples. Extensive experiments on the MVTec AD and LOCO datasets demonstrate that GAA achieves superior performance in both anomaly synthesis quality and downstream tasks such as localization and classification.
title Generate Aligned Anomaly: Region-Guided Few-Shot Anomaly Image-Mask Pair Synthesis for Industrial Inspection
topic Computer Vision and Pattern Recognition
url https://arxiv.org/abs/2507.09619