Controlling the magneto-transport properties of magnetic topological insulator thin films from Cr$_x$(Bi$_y\,$Sb$_{1-y}$)$_{2-x}$Te$_3$ via molecular beam epitaxy

Fuente: arXiv
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Autori principali: Karthein, Jan, Buchhorn, Jonas, Underwood, Kaycee, Jalil, Abdur Rehman, Vaßen-Carl, Max, Schüffelgen, Peter, Grützmacher, Detlev, Schäpers, Thomas
Natura: Preprint
Pubblicazione: 2025
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author Karthein, Jan
Buchhorn, Jonas
Underwood, Kaycee
Jalil, Abdur Rehman
Vaßen-Carl, Max
Schüffelgen, Peter
Grützmacher, Detlev
Schäpers, Thomas
author_facet Karthein, Jan
Buchhorn, Jonas
Underwood, Kaycee
Jalil, Abdur Rehman
Vaßen-Carl, Max
Schüffelgen, Peter
Grützmacher, Detlev
Schäpers, Thomas
contents In this work we present a systematic in-depth study of how we can alter the magneto-transport properties of magnetic topological insulator thin films by tuning the parameters of the molecular beam epitaxy. First, we show how a varying substrate temperature changes the surface morphology and when chosen properly leads to a high crystal quality. Next, the effect of the chromium concentration on the film roughness and crystal quality is investigated. Finally, both the substrate temperature and the chromium concentration are investigated with respect to their effect on the magneto-transport properties of the magnetic topological insulator thin films. It becomes apparent that the substrate temperature and the chromium concentration can be used to tune the Fermi level of the film which allows to make the material intrinsically charge neutral. A very low chromium concentration furthermore allows to tune the magnetic topological insulator into a regime where strong superconducting correlations can be expected when combining the material with a superconductor.
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id arxiv_https___arxiv_org_abs_2507_12115
institution arXiv
publishDate 2025
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spellingShingle Controlling the magneto-transport properties of magnetic topological insulator thin films from Cr$_x$(Bi$_y\,$Sb$_{1-y}$)$_{2-x}$Te$_3$ via molecular beam epitaxy
Karthein, Jan
Buchhorn, Jonas
Underwood, Kaycee
Jalil, Abdur Rehman
Vaßen-Carl, Max
Schüffelgen, Peter
Grützmacher, Detlev
Schäpers, Thomas
Mesoscale and Nanoscale Physics
In this work we present a systematic in-depth study of how we can alter the magneto-transport properties of magnetic topological insulator thin films by tuning the parameters of the molecular beam epitaxy. First, we show how a varying substrate temperature changes the surface morphology and when chosen properly leads to a high crystal quality. Next, the effect of the chromium concentration on the film roughness and crystal quality is investigated. Finally, both the substrate temperature and the chromium concentration are investigated with respect to their effect on the magneto-transport properties of the magnetic topological insulator thin films. It becomes apparent that the substrate temperature and the chromium concentration can be used to tune the Fermi level of the film which allows to make the material intrinsically charge neutral. A very low chromium concentration furthermore allows to tune the magnetic topological insulator into a regime where strong superconducting correlations can be expected when combining the material with a superconductor.
title Controlling the magneto-transport properties of magnetic topological insulator thin films from Cr$_x$(Bi$_y\,$Sb$_{1-y}$)$_{2-x}$Te$_3$ via molecular beam epitaxy
topic Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2507.12115