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Autores principales: Yang, Seong-Jun, Jung, Ju-Hyun, Lee, Eunsook, Han, Edmund, Choi, Min-Yeong, Jung, Daesung, Choi, Shinyoung, Park, Jun-Ho, Oh, Dongseok, Noh, Siwoo, Kim, Ki-Jeong, Huang, Pinshane Y., Hwang, Chan-Cuk, Kim, Cheol-Joo
Formato: Preprint
Publicado: 2025
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Acceso en línea:https://arxiv.org/abs/2507.22677
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author Yang, Seong-Jun
Jung, Ju-Hyun
Lee, Eunsook
Han, Edmund
Choi, Min-Yeong
Jung, Daesung
Choi, Shinyoung
Park, Jun-Ho
Oh, Dongseok
Noh, Siwoo
Kim, Ki-Jeong
Huang, Pinshane Y.
Hwang, Chan-Cuk
Kim, Cheol-Joo
author_facet Yang, Seong-Jun
Jung, Ju-Hyun
Lee, Eunsook
Han, Edmund
Choi, Min-Yeong
Jung, Daesung
Choi, Shinyoung
Park, Jun-Ho
Oh, Dongseok
Noh, Siwoo
Kim, Ki-Jeong
Huang, Pinshane Y.
Hwang, Chan-Cuk
Kim, Cheol-Joo
contents Crystalline films offer various physical properties based on the modulation of their thicknesses and atomic structures. The layer-by-layer assembly of atomically thin crystals provides powerful means to arbitrarily design films at the atomic-level, which are unattainable with existing growth technologies. However, atomically-clean assembly of the materials with high scalability and reproducibility remains challenging. We report programmed crystal assembly (PCA) of graphene and monolayer hexagonal boron nitride (ML hBN), assisted by van der Waals interactions, to form wafer-scale films of pristine interfaces with near-unity yield. The atomic configurations of the films are tailored with layer-resolved compositions and in-plane crystalline orientations. We demonstrate batch-fabricated tunnel device arrays with modulation of the resistance over orders of magnitude by thickness-control of the hBN barrier with single-atom precision, and large-scale, twisted multilayer graphene with programmable electronic band structures and crystal symmetries. Our results constitute an important development in the artificial design of large-scale films.
format Preprint
id arxiv_https___arxiv_org_abs_2507_22677
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Wafer-scale Programmed Assembly of One-atom-thick Crystals
Yang, Seong-Jun
Jung, Ju-Hyun
Lee, Eunsook
Han, Edmund
Choi, Min-Yeong
Jung, Daesung
Choi, Shinyoung
Park, Jun-Ho
Oh, Dongseok
Noh, Siwoo
Kim, Ki-Jeong
Huang, Pinshane Y.
Hwang, Chan-Cuk
Kim, Cheol-Joo
Materials Science
Crystalline films offer various physical properties based on the modulation of their thicknesses and atomic structures. The layer-by-layer assembly of atomically thin crystals provides powerful means to arbitrarily design films at the atomic-level, which are unattainable with existing growth technologies. However, atomically-clean assembly of the materials with high scalability and reproducibility remains challenging. We report programmed crystal assembly (PCA) of graphene and monolayer hexagonal boron nitride (ML hBN), assisted by van der Waals interactions, to form wafer-scale films of pristine interfaces with near-unity yield. The atomic configurations of the films are tailored with layer-resolved compositions and in-plane crystalline orientations. We demonstrate batch-fabricated tunnel device arrays with modulation of the resistance over orders of magnitude by thickness-control of the hBN barrier with single-atom precision, and large-scale, twisted multilayer graphene with programmable electronic band structures and crystal symmetries. Our results constitute an important development in the artificial design of large-scale films.
title Wafer-scale Programmed Assembly of One-atom-thick Crystals
topic Materials Science
url https://arxiv.org/abs/2507.22677