Extreme-ultraviolet laser generation at 118 nm via adaptive random additional periodic-phase engineering in a LiF crystal

Fuente: arXiv

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Bibliographic Details
Main Authors:	Cheng, Yanling, Zhang, Bin, Liang, Fei, Yu, Haohai, Zhang, Huaijin
Format:	Preprint
Published:	2025
Subjects:	Optics Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2508.05412