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Extreme-ultraviolet laser generation at 118 nm via adaptive random additional periodic-phase engineering in a LiF crystal

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Cheng, Yanling, Zhang, Bin, Liang, Fei, Yu, Haohai, Zhang, Huaijin
Format:	Preprint
Publié:	2025
Sujets:	Optics Applied Physics
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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