Millisecond-scale Volatile Memory in HZO Ferroelectric Capacitors for Bio-inspired Temporal Computing
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arXiv
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| Autores principales: | , , , |
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| Formato: | Preprint |
| Publicado: |
2025
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| _version_ | 1866908486665764864 |
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| author | Fehlings, Luca Mikolajick, Thomas Noheda, Beatriz Covi, Erika |
| author_facet | Fehlings, Luca Mikolajick, Thomas Noheda, Beatriz Covi, Erika |
| contents | With the broad recent research on ferroelectric hafnium oxide for non-volatile memory technology, depolarization effects in HfO2-based ferroelectric devices gained a lot of interest. Understanding the physical mechanisms regulating the retention of these devices provides an excellent opportunity for device optimization both towards non-volatile memory applications and towards real-time signal processing applications in which controlled time constants are of paramount importance. Indeed, we argue that ferroelectric devices, particularly HfO2-based, are an elegant solution to realize possibly arbitrary time constants in a single scaled memory device, which paves the way for temporal and brain-inspired computing in hardware. Here we present a ferroelectric capacitor stack realizing volatile memory due to its unique interface configuration. We provide electrical characterization of the device to motivate its use for realizing time constants in hardware, followed by an investigation of the electronic mechanisms and their possible relation to the observed retention times to facilitate further modeling of the retention process in HfO2-based ferroelectric capacitors. In the presented device, internal electric fields stabilize one polarization of the ferroelectric film, opening the possibility for unipolar operation with millisecond retention for the unstable polarization state. We show a dependence of the retention on both the polarization as well as the electrical stimuli, allowing us to exploit a range of time scales in a single device. Further, the intentionally defective interface in the presented material stack allows an insight into the interplay between retention loss in HfO2-based ferroelectric devices and the internal bias field, which we relate to the interface composition and the role of oxygen vacancies as a possible source of the internal bias fields. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2508_08973 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Millisecond-scale Volatile Memory in HZO Ferroelectric Capacitors for Bio-inspired Temporal Computing Fehlings, Luca Mikolajick, Thomas Noheda, Beatriz Covi, Erika Emerging Technologies Materials Science With the broad recent research on ferroelectric hafnium oxide for non-volatile memory technology, depolarization effects in HfO2-based ferroelectric devices gained a lot of interest. Understanding the physical mechanisms regulating the retention of these devices provides an excellent opportunity for device optimization both towards non-volatile memory applications and towards real-time signal processing applications in which controlled time constants are of paramount importance. Indeed, we argue that ferroelectric devices, particularly HfO2-based, are an elegant solution to realize possibly arbitrary time constants in a single scaled memory device, which paves the way for temporal and brain-inspired computing in hardware. Here we present a ferroelectric capacitor stack realizing volatile memory due to its unique interface configuration. We provide electrical characterization of the device to motivate its use for realizing time constants in hardware, followed by an investigation of the electronic mechanisms and their possible relation to the observed retention times to facilitate further modeling of the retention process in HfO2-based ferroelectric capacitors. In the presented device, internal electric fields stabilize one polarization of the ferroelectric film, opening the possibility for unipolar operation with millisecond retention for the unstable polarization state. We show a dependence of the retention on both the polarization as well as the electrical stimuli, allowing us to exploit a range of time scales in a single device. Further, the intentionally defective interface in the presented material stack allows an insight into the interplay between retention loss in HfO2-based ferroelectric devices and the internal bias field, which we relate to the interface composition and the role of oxygen vacancies as a possible source of the internal bias fields. |
| title | Millisecond-scale Volatile Memory in HZO Ferroelectric Capacitors for Bio-inspired Temporal Computing |
| topic | Emerging Technologies Materials Science |
| url | https://arxiv.org/abs/2508.08973 |