Multiphysics Simulation and First Prototype Development of a Microwave Plasma System for Chemical Vapour Deposition (CVD) Applications

Fuente: arXiv
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Bibliographic Details
Main Authors: Akash, Akash, Pandey, Sanjeev Kumar, Madana, Venkata Sai Teja, Manikandan, S., Gunasekaran, Guhan, Ravi, Sundar, Narayanana, Sethu, Nikhil, C., Sirse, Nishant, Sathyan, S., Arunachalam, N., Rao, M. S Ramachandra
Format: Preprint
Published: 2025
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