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Main Authors: Zhou, Qi, Yen, Hao-Chi, Lan, Qizhen, Gallegos, Arynn O., Hu, Manchen, Frohna, Kyle, Niese, Hannah, Lin, Da, Murrietta, Natalia, Narayanan, Pournima, Schloemer, Tracy H., Pucurimay, Linda, Fernández, Sebastian, Seitz, Michael, Congreve, Daniel N.
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2508.16668
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author Zhou, Qi
Yen, Hao-Chi
Lan, Qizhen
Gallegos, Arynn O.
Hu, Manchen
Frohna, Kyle
Niese, Hannah
Lin, Da
Murrietta, Natalia
Narayanan, Pournima
Schloemer, Tracy H.
Pucurimay, Linda
Fernández, Sebastian
Seitz, Michael
Congreve, Daniel N.
author_facet Zhou, Qi
Yen, Hao-Chi
Lan, Qizhen
Gallegos, Arynn O.
Hu, Manchen
Frohna, Kyle
Niese, Hannah
Lin, Da
Murrietta, Natalia
Narayanan, Pournima
Schloemer, Tracy H.
Pucurimay, Linda
Fernández, Sebastian
Seitz, Michael
Congreve, Daniel N.
contents Micro- and nanoscale fabrication, which enables precise construction of intricate three-dimensional structures, is of foundational importance for advancing innovation in plasmonics, nanophotonics, and biomedical applications. However, scaling fabrication to industrially relevant levels remains a significant challenge. We demonstrate that triplet-triplet annihilation upconversion (TTA-UC) offers a unique opportunity to increase fabrication speeds and scalability of micro- and nanoscale 3D structures. Due to its nonlinearity and low power requirements, TTA-UC enables localized polymerization with nanoscale resolutions while simultaneously printing millions of voxels per second through optical parallelization using off-the-shelf light-emitting diodes and digital micromirror devices. Our system design and component integration empower fabrication with a minimum lateral feature size down to 230 nm and speeds up to 112 million voxels per second at a power of 7.0 nW per voxel. This combination of high resolution and fast print speed demonstrates that TTA-UC is a significant advancement in nanofabrication technique, evidenced by the fabrication of hydrophobic nanostructures on a square-centimeter scale, paving the way for industrial nanomanufacturing.
format Preprint
id arxiv_https___arxiv_org_abs_2508_16668
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Low Power, Scalable Nanofabrication via Photon Upconversion
Zhou, Qi
Yen, Hao-Chi
Lan, Qizhen
Gallegos, Arynn O.
Hu, Manchen
Frohna, Kyle
Niese, Hannah
Lin, Da
Murrietta, Natalia
Narayanan, Pournima
Schloemer, Tracy H.
Pucurimay, Linda
Fernández, Sebastian
Seitz, Michael
Congreve, Daniel N.
Applied Physics
Materials Science
Micro- and nanoscale fabrication, which enables precise construction of intricate three-dimensional structures, is of foundational importance for advancing innovation in plasmonics, nanophotonics, and biomedical applications. However, scaling fabrication to industrially relevant levels remains a significant challenge. We demonstrate that triplet-triplet annihilation upconversion (TTA-UC) offers a unique opportunity to increase fabrication speeds and scalability of micro- and nanoscale 3D structures. Due to its nonlinearity and low power requirements, TTA-UC enables localized polymerization with nanoscale resolutions while simultaneously printing millions of voxels per second through optical parallelization using off-the-shelf light-emitting diodes and digital micromirror devices. Our system design and component integration empower fabrication with a minimum lateral feature size down to 230 nm and speeds up to 112 million voxels per second at a power of 7.0 nW per voxel. This combination of high resolution and fast print speed demonstrates that TTA-UC is a significant advancement in nanofabrication technique, evidenced by the fabrication of hydrophobic nanostructures on a square-centimeter scale, paving the way for industrial nanomanufacturing.
title Low Power, Scalable Nanofabrication via Photon Upconversion
topic Applied Physics
Materials Science
url https://arxiv.org/abs/2508.16668