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Enhanced Performance of FeFET Gate Stack via Heterogeneously co-doped Ferroelectric HfO$_2$ Films

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Yang, Shouzhuo, Lehninger, David, Reinig, Peter, Schöne, Fred, Hoffmann, Raik, Seidel, Konrad, Lederer, Maximilian, Gerlach, Gerald
Format:	Preprint
Publié:	2025
Sujets:	Materials Science
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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