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Enhanced Performance of FeFET Gate Stack via Heterogeneously co-doped Ferroelectric HfO$_2$ Films

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Yang, Shouzhuo, Lehninger, David, Reinig, Peter, Schöne, Fred, Hoffmann, Raik, Seidel, Konrad, Lederer, Maximilian, Gerlach, Gerald
Natura:	Preprint
Pubblicazione:	2025
Soggetti:	Materials Science
Accesso online:	Acceder al recurso
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