Adhesion Control through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces

Fuente: arXiv
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Hauptverfasser: Çiftçi, Tunç, Cottom, Jonathon, Hahury, Rachid, Olsson, Emilia, Weber, Bart
Format: Preprint
Veröffentlicht: 2025
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author Çiftçi, Tunç
Cottom, Jonathon
Hahury, Rachid
Olsson, Emilia
Weber, Bart
author_facet Çiftçi, Tunç
Cottom, Jonathon
Hahury, Rachid
Olsson, Emilia
Weber, Bart
contents Adhesion plays a pivotal role in computer chip manufacturing, directly affecting the precision and durability of positioning components such as wafer stages. Electrical biasing is widely employed to eliminate floating potential and to enable electrostatic clamping. However, upon electrical grounding adhesion can persist and there is limited knowledge about the nature of this adhesion hysteresis. Here, we investigate potential causes underlying electric field-induced adhesion hysteresis at the interface between an n-type AFM tip and a p-type silicon sample using atomic force microscopy. Our findings reveal that neither charge trapping nor siloxane bond formation significantly impacts the measured adhesion. Surprisingly, we show that adhesion can be tuned through electric field-induced water adsorption under low relative humidity (RH < 10%). Our results provide new insights into adhesion hysteresis and opportunities for adhesion control.
format Preprint
id arxiv_https___arxiv_org_abs_2508_17724
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Adhesion Control through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces
Çiftçi, Tunç
Cottom, Jonathon
Hahury, Rachid
Olsson, Emilia
Weber, Bart
Soft Condensed Matter
Adhesion plays a pivotal role in computer chip manufacturing, directly affecting the precision and durability of positioning components such as wafer stages. Electrical biasing is widely employed to eliminate floating potential and to enable electrostatic clamping. However, upon electrical grounding adhesion can persist and there is limited knowledge about the nature of this adhesion hysteresis. Here, we investigate potential causes underlying electric field-induced adhesion hysteresis at the interface between an n-type AFM tip and a p-type silicon sample using atomic force microscopy. Our findings reveal that neither charge trapping nor siloxane bond formation significantly impacts the measured adhesion. Surprisingly, we show that adhesion can be tuned through electric field-induced water adsorption under low relative humidity (RH < 10%). Our results provide new insights into adhesion hysteresis and opportunities for adhesion control.
title Adhesion Control through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces
topic Soft Condensed Matter
url https://arxiv.org/abs/2508.17724