Amorphous $CaSO_{4}$ nanocrystal deposits for friction and wear reduction at silicon interfaces
Fuente:
arXiv
Salvato in:
| Autori principali: | , , , |
|---|---|
| Natura: | Preprint |
| Pubblicazione: |
2025
|
| Soggetti: | |
| Accesso online: | |
| Tags: |
Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne!!
|
| _version_ | 1866916915824295936 |
|---|---|
| author | Vernooij, Tijn Çiftçi, Tunç Shahidzadeh, Noushine Weber, Bart |
| author_facet | Vernooij, Tijn Çiftçi, Tunç Shahidzadeh, Noushine Weber, Bart |
| contents | When an object is placed on a surface, friction and wear cause uncertainty in its exact position, and thus challenge precision manufacturing. Here, we explore the development of a sacrificial nanocrystal deposit that can suppress friction and wear. Amorphous \ce{CaSO4} nancrystals are deposited through salt solution droplet deposition followed by evaporation. During droplet drying, a precursor film of the aqueous \ce{CaSO4} solution spreads onto a hydrophilic silicon wafer, thus nucleating evenly spread unfaceted amorphous nanocrystals of \ce{CaSO4} on the wafer surface. We used atomic force microscopy to study the extent, topography, and friction and wear behavior of the deposited nanocrystals. We find that the sacrificial layer of nanocrystals is easy to apply and remove, spreads over large (few cm) areas with a constant thickness of about 8 nm, and has favorable friction and wear behavior. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2508_17869 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Amorphous $CaSO_{4}$ nanocrystal deposits for friction and wear reduction at silicon interfaces Vernooij, Tijn Çiftçi, Tunç Shahidzadeh, Noushine Weber, Bart Soft Condensed Matter When an object is placed on a surface, friction and wear cause uncertainty in its exact position, and thus challenge precision manufacturing. Here, we explore the development of a sacrificial nanocrystal deposit that can suppress friction and wear. Amorphous \ce{CaSO4} nancrystals are deposited through salt solution droplet deposition followed by evaporation. During droplet drying, a precursor film of the aqueous \ce{CaSO4} solution spreads onto a hydrophilic silicon wafer, thus nucleating evenly spread unfaceted amorphous nanocrystals of \ce{CaSO4} on the wafer surface. We used atomic force microscopy to study the extent, topography, and friction and wear behavior of the deposited nanocrystals. We find that the sacrificial layer of nanocrystals is easy to apply and remove, spreads over large (few cm) areas with a constant thickness of about 8 nm, and has favorable friction and wear behavior. |
| title | Amorphous $CaSO_{4}$ nanocrystal deposits for friction and wear reduction at silicon interfaces |
| topic | Soft Condensed Matter |
| url | https://arxiv.org/abs/2508.17869 |