Large Language Models (LLMs) for Electronic Design Automation (EDA)

Fuente: arXiv
Saved in:
Bibliographic Details
Main Authors: Xu, Kangwei, Schwachhofer, Denis, Blocklove, Jason, Polian, Ilia, Domanski, Peter, Pflüger, Dirk, Garg, Siddharth, Karri, Ramesh, Sinanoglu, Ozgur, Knechtel, Johann, Zhao, Zhuorui, Schlichtmann, Ulf, Li, Bing
Format: Preprint
Published: 2025
Subjects:
Online Access:
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866909755711160320
author Xu, Kangwei
Schwachhofer, Denis
Blocklove, Jason
Polian, Ilia
Domanski, Peter
Pflüger, Dirk
Garg, Siddharth
Karri, Ramesh
Sinanoglu, Ozgur
Knechtel, Johann
Zhao, Zhuorui
Schlichtmann, Ulf
Li, Bing
author_facet Xu, Kangwei
Schwachhofer, Denis
Blocklove, Jason
Polian, Ilia
Domanski, Peter
Pflüger, Dirk
Garg, Siddharth
Karri, Ramesh
Sinanoglu, Ozgur
Knechtel, Johann
Zhao, Zhuorui
Schlichtmann, Ulf
Li, Bing
contents With the growing complexity of modern integrated circuits, hardware engineers are required to devote more effort to the full design-to-manufacturing workflow. This workflow involves numerous iterations, making it both labor-intensive and error-prone. Therefore, there is an urgent demand for more efficient Electronic Design Automation (EDA) solutions to accelerate hardware development. Recently, large language models (LLMs) have shown remarkable advancements in contextual comprehension, logical reasoning, and generative capabilities. Since hardware designs and intermediate scripts can be represented as text, integrating LLM for EDA offers a promising opportunity to simplify and even automate the entire workflow. Accordingly, this paper provides a comprehensive overview of incorporating LLMs into EDA, with emphasis on their capabilities, limitations, and future opportunities. Three case studies, along with their outlook, are introduced to demonstrate the capabilities of LLMs in hardware design, testing, and optimization. Finally, future directions and challenges are highlighted to further explore the potential of LLMs in shaping the next-generation EDA, providing valuable insights for researchers interested in leveraging advanced AI technologies for EDA.
format Preprint
id arxiv_https___arxiv_org_abs_2508_20030
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Large Language Models (LLMs) for Electronic Design Automation (EDA)
Xu, Kangwei
Schwachhofer, Denis
Blocklove, Jason
Polian, Ilia
Domanski, Peter
Pflüger, Dirk
Garg, Siddharth
Karri, Ramesh
Sinanoglu, Ozgur
Knechtel, Johann
Zhao, Zhuorui
Schlichtmann, Ulf
Li, Bing
Systems and Control
Artificial Intelligence
Hardware Architecture
Machine Learning
With the growing complexity of modern integrated circuits, hardware engineers are required to devote more effort to the full design-to-manufacturing workflow. This workflow involves numerous iterations, making it both labor-intensive and error-prone. Therefore, there is an urgent demand for more efficient Electronic Design Automation (EDA) solutions to accelerate hardware development. Recently, large language models (LLMs) have shown remarkable advancements in contextual comprehension, logical reasoning, and generative capabilities. Since hardware designs and intermediate scripts can be represented as text, integrating LLM for EDA offers a promising opportunity to simplify and even automate the entire workflow. Accordingly, this paper provides a comprehensive overview of incorporating LLMs into EDA, with emphasis on their capabilities, limitations, and future opportunities. Three case studies, along with their outlook, are introduced to demonstrate the capabilities of LLMs in hardware design, testing, and optimization. Finally, future directions and challenges are highlighted to further explore the potential of LLMs in shaping the next-generation EDA, providing valuable insights for researchers interested in leveraging advanced AI technologies for EDA.
title Large Language Models (LLMs) for Electronic Design Automation (EDA)
topic Systems and Control
Artificial Intelligence
Hardware Architecture
Machine Learning
url https://arxiv.org/abs/2508.20030