Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching

Fuente: arXiv

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Bibliographic Details
Main Authors:	Giesekus, Jonas, Pletzer, Anton, Beckfeld, Florian, Noesges, Katharina, Bock, Claudia, Schulze, Julian
Format:	Preprint
Published:	2025
Subjects:	Plasma Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2509.01171