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| Main Authors: | , , , , , , , , , |
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| Format: | Preprint |
| Published: |
2025
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2509.01911 |
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| _version_ | 1866912566327902208 |
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| author | Ma, Yintao Sun, Beibei Chen, Pan Chen, Yao Wang, Yanbin Guo, Ju Yu, Mingzhi Yang, Ping Lina, Qijing Zhao, Libo |
| author_facet | Ma, Yintao Sun, Beibei Chen, Pan Chen, Yao Wang, Yanbin Guo, Ju Yu, Mingzhi Yang, Ping Lina, Qijing Zhao, Libo |
| contents | Rydberg-atom electrometry, as an emerging cutting-edge technology, features high sensitivity, broad bandwidth, calibration-free operation, and beyond. However, until now the key atomic vapor cells used for confining electric field-sensitive Rydberg atoms nearly made with traditional glass-blown techniques, hindering the miniaturization, integration, and batch manufacturing. Here, we present the wafer-level MEMS atomic vapor cells with glass-silicon-glass sandwiched structure that are batch-manufactured for both frequency stability and electric field measurement. We use specially customized ultra-thick silicon wafers with a resistivity exceeding 10,000 cm, three orders of magnitude higher than that of typical silicon, and a thickness of 6 mm, providing a 4-fold improvement in optical interrogation length. With the as-developed MEMS atomic vapor cell, we configured a high-sensitivity Rydberg-atom electrometry with the minimal detectable microwave field to be 2.8 mV/cm. This combination of miniaturization and sensitivity represents a significant advance in the state-of-the-art field of Rydberg-atom electrometry, paving the way for chip-scale Rydberg-atom electrometry and potentially opening up new applications in a wider variety of fields. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2509_01911 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | MEMS Vapor Cells-based Rydberg-atom Electrometry Toward Miniaturization and High Sensitivity Ma, Yintao Sun, Beibei Chen, Pan Chen, Yao Wang, Yanbin Guo, Ju Yu, Mingzhi Yang, Ping Lina, Qijing Zhao, Libo Atomic Physics Quantum Physics Rydberg-atom electrometry, as an emerging cutting-edge technology, features high sensitivity, broad bandwidth, calibration-free operation, and beyond. However, until now the key atomic vapor cells used for confining electric field-sensitive Rydberg atoms nearly made with traditional glass-blown techniques, hindering the miniaturization, integration, and batch manufacturing. Here, we present the wafer-level MEMS atomic vapor cells with glass-silicon-glass sandwiched structure that are batch-manufactured for both frequency stability and electric field measurement. We use specially customized ultra-thick silicon wafers with a resistivity exceeding 10,000 cm, three orders of magnitude higher than that of typical silicon, and a thickness of 6 mm, providing a 4-fold improvement in optical interrogation length. With the as-developed MEMS atomic vapor cell, we configured a high-sensitivity Rydberg-atom electrometry with the minimal detectable microwave field to be 2.8 mV/cm. This combination of miniaturization and sensitivity represents a significant advance in the state-of-the-art field of Rydberg-atom electrometry, paving the way for chip-scale Rydberg-atom electrometry and potentially opening up new applications in a wider variety of fields. |
| title | MEMS Vapor Cells-based Rydberg-atom Electrometry Toward Miniaturization and High Sensitivity |
| topic | Atomic Physics Quantum Physics |
| url | https://arxiv.org/abs/2509.01911 |