Cryogenic performance of field-effect transistors and amplifiers based on selective area grown InAs nanowires

Fuente: arXiv
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Main Authors: Meucci, Giulia, Olšteins, Dags, Carrad, Damon J., Nagda, Gunjan, Beznasyuk, Daria V., Petersen, Christian E. N., Martí-Sánchez, Sara, Arbiol, Jordi, Jespersen, Thomas Sand
Format: Preprint
Published: 2025
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author Meucci, Giulia
Olšteins, Dags
Carrad, Damon J.
Nagda, Gunjan
Beznasyuk, Daria V.
Petersen, Christian E. N.
Martí-Sánchez, Sara
Arbiol, Jordi
Jespersen, Thomas Sand
author_facet Meucci, Giulia
Olšteins, Dags
Carrad, Damon J.
Nagda, Gunjan
Beznasyuk, Daria V.
Petersen, Christian E. N.
Martí-Sánchez, Sara
Arbiol, Jordi
Jespersen, Thomas Sand
contents Indium-Arsenide (InAs) nanowire field-effect transistors (NWFETs) are promising platforms for high-speed, low-power nanoelectronics operating at cryogenic conditions, relevant for quantum information processing. We use selective area growth (SAG) of nanowires to realize scalable and planar nanowire device geometries that are compatible with standard semiconductor processing techniques. NWFETs are fabricated and their low temperature characteristics - including ION/IOFF ratios, threshold voltages, sub-threshold slope, interfacial trap density, hysteresis, and mobility - are characterized. The NWFETs operate effectively in integrated circuitry relying on saturation-mode operation. In sub-threshold applications such as amplifiers, we find bandwidths exceeding our cryostat wiring, but the gate hysteresis presents challenges for precise tuning of the amplifier operating point. We discuss the role of crystal imperfections and fabrication processes on the transistor characteristics and propose strategies for further improvements.
format Preprint
id arxiv_https___arxiv_org_abs_2509_02078
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Cryogenic performance of field-effect transistors and amplifiers based on selective area grown InAs nanowires
Meucci, Giulia
Olšteins, Dags
Carrad, Damon J.
Nagda, Gunjan
Beznasyuk, Daria V.
Petersen, Christian E. N.
Martí-Sánchez, Sara
Arbiol, Jordi
Jespersen, Thomas Sand
Mesoscale and Nanoscale Physics
Materials Science
Indium-Arsenide (InAs) nanowire field-effect transistors (NWFETs) are promising platforms for high-speed, low-power nanoelectronics operating at cryogenic conditions, relevant for quantum information processing. We use selective area growth (SAG) of nanowires to realize scalable and planar nanowire device geometries that are compatible with standard semiconductor processing techniques. NWFETs are fabricated and their low temperature characteristics - including ION/IOFF ratios, threshold voltages, sub-threshold slope, interfacial trap density, hysteresis, and mobility - are characterized. The NWFETs operate effectively in integrated circuitry relying on saturation-mode operation. In sub-threshold applications such as amplifiers, we find bandwidths exceeding our cryostat wiring, but the gate hysteresis presents challenges for precise tuning of the amplifier operating point. We discuss the role of crystal imperfections and fabrication processes on the transistor characteristics and propose strategies for further improvements.
title Cryogenic performance of field-effect transistors and amplifiers based on selective area grown InAs nanowires
topic Mesoscale and Nanoscale Physics
Materials Science
url https://arxiv.org/abs/2509.02078